Chip Supplies
High Sensitivity Standard g-line Positive-tone Photoresist
2014-11-05 16:37:48

High sensitivity broad-band,g-line positive-tone photoresist,optimized for

wide production of semiconductor

 

FEATURES

1) Achievement for high sensitivity and high throughput

2) Improvement for wet etching by high adhesion

3) Trust on delivery reference at wide field and industry

 

SAMPLE PROCESS CONDITIONS

Pre-bake: 100 60sec.(DHP)

Exposureg-line stepper and/or Contact Aligner

Developing: AZ300MIF 23 60sec.Puddle

Rinse: DI-water 30sec.

Post-bake: 120 120sec.(DHP)

Stripping: AZ Remover and/or O2 plasma-ashing

 

 

 

 

 

 

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